The LC-EVAP series of thin film vapor deposition systems include gloveboxes that can maintain an inert atmosphere of less than 1ppm oxygen and moisture. They come complete with integrated evaporation systems and spin coaters for depositing materials onto substrates under completely inert conditions.
The system can come equipped with our standard antechamber, mini antechamber or with a unique “T” style antechamber to connect two environments.
The evaporation units are supplied by The Kurt J. Lesker Company. We offer the full range of systems from simple to very complex and we are sure we can supply a system that meets your requirements.